Ion Implanters

All-in-One Ion Implanter
Saion
The latest model, utilizing a brand-new concept and enabling a wide range of implantations covering high current and medium current.
Click here for detailed information about Ion Implanters
Features

- Support for 200-mm wafers as well as 300-mm wafers, which is expandable to 450-mm wafers
- Framework that integrates high-current (HC) and medium-current (MC) ion implanters
- Energy range: Min. 0.2 keV / Max. 630 keV
- High performance of the implanter main body achieved by a high current value and wide energy range
- New value brought about by inter-model compatibility, including improved flexibility and effective implanter usage rate among models for production and reduced man-hours for mastering
- Improved productivity and reduced fine particles as a result of adopting a new transfer system
- Improved speed and quality of beam angle measurement as a result of adopting a new angle measuring system
- The beam angle in the same plane as the wafer can be measured
- Standardized RF shower system
- Minimized metal contamination
- Favorable uniformity with symmetric scanning
- Energy-saving performance of the electrostatic equipment unit
- Installation of the MIND system
Product lines

All-in-one type Ion Implanters
All-in-one implanter with flexibility in applications that combine medium-current and high-current technologies
For detailed information about the products please contact
Phone
Sumitomo Heavy Industries Ion Technology Co., Ltd.
Web
Sumitomo Heavy Industries Ion Technology Co., Ltd.