Ion Implanters

All-in-One Ion Implanter

The latest model, utilizing a brand-new concept and enabling a wide range of implantations covering high current and medium current.

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  • Support for 200-mm wafers as well as 300-mm wafers, which is expandable to 450-mm wafers
  • Framework that integrates high-current (HC) and medium-current (MC) ion implanters
  • Energy range: Min. 0.2 keV / Max. 630 keV
  • High performance of the implanter main body achieved by a high current value and wide energy range
  • New value brought about by inter-model compatibility, including improved flexibility and effective implanter usage rate among models for production and reduced man-hours for mastering
  • Improved productivity and reduced fine particles as a result of adopting a new transfer system
  • Improved speed and quality of beam angle measurement as a result of adopting a new angle measuring system
  • The beam angle in the same plane as the wafer can be measured
  • Standardized RF shower system
  • Minimized metal contamination
  • Favorable uniformity with symmetric scanning
  • Energy-saving performance of the electrostatic equipment unit
  • Installation of the MIND system

Product lines

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Sumitomo Heavy Industries Ion Technology Co., Ltd.


Sumitomo Heavy Industries Ion Technology Co., Ltd.

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