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It is supplied as a source of high magnetic field for mono-crystalline silicon growth systems by Magnetic field applied Czochralski (MCZ) method.MCZ

characteristics of MCZ
center magnetic field(T) bore diameter at room temperature(mm) initial cooling down time(hr) magnetizing time(min) dimension Weight(kg)
vvertical horizotal outer diameter(mm) hight(mm)
0.2 1,600 - 140 25 2,300 946 6,200

Sumitomo Heavy Industries. Ltd. Industrial Equipment Division