Laser Annealing

Laser annealing system for semiconductors

This solid state laser annealing system makes it possible to perform unique double pulse processes. The development of next generation processes is supported with high repeating rates and a high pulse energy stability that are maintenance free and in a compact design.

Features

Laser annealing system for semiconductors

  1. 1High pulse energy stability

An energy feedback function has been incorporated. A surface internal uniformity of σ≤1% has been attained.

  1. 2Double pulse control

The temperature distribution and time in the direction of depth are controlled by a unique double pulse process. An annealing process at high temperatures is possible even with temperature restrictions.

Product lines

For detailed information about the products please contact

Mechatronics division

Products for inquiries
Precision Positioning Equipment, Laser Annealing, Laser Drills, Control Systems, Motion Components