The main content of this page begins here.
This solid state laser annealing system makes it possible to perform unique double pulse processes. The development of next generation processes is supported with high repeating rates and a high pulse energy stability that are maintenance free and in a compact design.
Laser annealing system for semiconductors
- 1High pulse energy stability
An energy feedback function has been incorporated. A surface internal uniformity of σ≤1% has been attained.
- 2Double pulse control
The temperature distribution and time in the direction of depth are controlled by a unique double pulse process. An annealing process at high temperatures is possible even with temperature restrictions.
High performance solid state laser annealing system that supports double pulse processes. This product promotes the development of next generation processes.
- For detailed information about the products please contact
- Products for inquiries
- Precision Positioning Equipment, Laser Annealing, Laser Drills, Control Systems, Motion Components