SUMITOMO HEAVY INDUSTRIES TECHNICAL REVIEW
Characteristic Improvement of High Power Semiconducter by Ion Irradiation
Shusaku HAMADA, Tomoki KIKUCHI and Ryosuke NAKANISHI

Characteristic Improvement of High Power Semiconducter by Ion Irradiation

Local lifetime control technology for high power semiconductors has been an effective energy conservation solution in recent years. S.H.I. Examination & Inspection, Ltd. (SHIEI) has achieved such technology by irradiating high-energy proton, helium-3, andhelium-4 ions through cyclotron and Van de Graaff accelerators. SHIEI has succeeded in providing information on optimum ion irradiation conditions to customers by introducing a commercial assessor that evaluates the recovery time (Trr). forward voltage (V1), and leakage current (Irr), all of which will be changed as a result of ion irradiation. In addition, SHIEI has developed new devices called Deep Level Transient Spectroscopy system (based on DLTS method) and capacitance-voltage (C-V) profiling unit, both of which apply the reverse bias of up to 550 V to measure the trap energy level and impurities in the silicon formed after the ion irradiation under similar conditions to those for the mounted high power semiconductors.